Title:
METAL VAPOR DEPOSITED FILM
Document Type and Number:
WIPO Patent Application WO/2023/181365
Kind Code:
A1
Abstract:
Provided is a metal vapor deposited film that has high gas-barrier characteristics against gas such as water vapor and oxygen, and provides high adhesion strength between a film base material and a metal thin film layer. A metal vapor deposited film A according to the present invention has a layer configuration in which at least an anchor coating layer 2 and a metal thin film layer 3 are sequentially laminated on one surface of a film base material 1. The anchor coating layer 2 is a layer at least containing a main agent, which is a polyester-based resin having a viscosity average molecular weight of 500-10,000, a curing agent, which is an isocyanate compound, and an additive. The solid content weight ratio of the main agent : the curing agent equals 100 : 20 to 200, and (main agent+curing agent) : additive= 100 : 10 to 200 (solid content weight ratio) is satisfied. The additive is a compound having a glucose ring. Examples of the curing agent include aromatic isocyanate compounds and alicyclic isocyanate compounds.
Inventors:
FUKUMOTO MASARU (JP)
YOSHINO YUHEI (JP)
YANO HARUNA (JP)
YOSHINO YUHEI (JP)
YANO HARUNA (JP)
Application Number:
PCT/JP2022/014456
Publication Date:
September 28, 2023
Filing Date:
March 25, 2022
Export Citation:
Assignee:
REIKO KK (JP)
International Classes:
B32B15/08
Domestic Patent References:
| WO2019124089A1 | 2019-06-27 |
Foreign References:
| JP2017154456A | 2017-09-07 | |||
| JPH0940904A | 1997-02-10 | |||
| JP2022017007A | 2022-01-25 | |||
| JP2003222723A | 2003-08-08 | |||
| JP2017196775A | 2017-11-02 |
Attorney, Agent or Firm:
MINORI PATENT PROFESSION CORPORATION (JP)
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