Title:
A METALLIC BUILDING ELEMENT FOR OPTOELECTRONICS
Document Type and Number:
WIPO Patent Application WO2000011628
Kind Code:
A8
Abstract:
The present invention relates to a method of patterning metallic building elements, and also to a metallic building element, where the measuring accuracy achieved can lie in the sub-micrometer range. Starting from a silicon master or original that can be etched to sub-micrometer precision and then plated with a metal, such as nickel (3), on the silicon surface, there can be produced a nickel shim where precision and surface fineness can lie in the sub-micrometer range. Subsequent to removal of the silicon master, a photo-sensitive material (5) can be used in liquid form or in film form to create mould cavities (9) that reach down to the nickel shim. These cavities can then be metal-plated to provide a building element (8) of higher precision in three dimensions.
Inventors:
BLOM CLAES
VIEIDER CHRISTIAN
LARSSON OLLE
VIEIDER CHRISTIAN
LARSSON OLLE
Application Number:
PCT/SE1999/001395
Publication Date:
May 18, 2000
Filing Date:
August 18, 1999
Export Citation:
Assignee:
ERICSSON TELEFON AB L M (SE)
International Classes:
C25D1/00; G02B6/36; (IPC1-7): G02B6/42
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