Title:
(METH)ACRYLATE COMPOUND, (METH)ACRYLIC COPOLYMER AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME
Document Type and Number:
WIPO Patent Application WO/2015/115613
Kind Code:
A1
Abstract:
The present invention provides: a good balanced resist which has high sensitivity without deteriorating basic physical properties of a chemically amplified resist such as resolution and line edge roughness (LER); and a compound for resists.
The present invention relates to: a (meth)acrylate compound represented by general formula (1); a method for producing the (meth)acrylate compound; a (meth)acrylic copolymer which is obtained by polymerizing a (meth)acrylate compound represented by general formula (1); and a photosensitive resin composition of the (meth)acrylic copolymer.
(In general formula (1), R1 represents a hydrogen atom or a methyl group; R2 represents a linear or branched alkyl group having 2-4 carbon atoms; and R3 moieties may be the same as or different from each other, and each represents a group represented by formula (2) or (3), or the like.)
(In formulae (2) and (3), the symbols are as defined in the description.)
Inventors:
TANAKA HIROYASU (JP)
HAYAKAWA SHOICHI (JP)
TANAGI HIROYUKI (JP)
FURUKAWA KIKUO (JP)
HORIKOSHI HIROSHI (JP)
HAYAKAWA SHOICHI (JP)
TANAGI HIROYUKI (JP)
FURUKAWA KIKUO (JP)
HORIKOSHI HIROSHI (JP)
Application Number:
PCT/JP2015/052742
Publication Date:
August 06, 2015
Filing Date:
January 30, 2015
Export Citation:
Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
C08F20/28; C07D307/33; C07D407/12; G03F7/039
Foreign References:
| JP2005154304A | 2005-06-16 | |||
| JP2010039142A | 2010-02-18 | |||
| JP2006243474A | 2006-09-14 | |||
| JP2004323704A | 2004-11-18 |
Attorney, Agent or Firm:
KOBAYASHI Hiroshi et al. (JP)
Kobayashi 浩 (JP)
Kobayashi 浩 (JP)
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