Title:
METHOD FOR ACCELERATING SELF-ASSEMBLY OF BLOCK COPOLYMER AND METHOD FOR FORMING SELF-ASSEMBLED PATTERN OF BLOCK COPOLYMER USING SAME
Document Type and Number:
WIPO Patent Application WO/2010/055601
Kind Code:
A1
Abstract:
A block copolymer film (102) is formed on a substrate (101). The block copolymer film (102) is annealed under an inert gas atmosphere such as a neon atmosphere. Thus, the outside (mainly on the upper side) of the block copolymer film (102) is brought into an unpolarized state, whereby, for example, a hydrophobic monomer unit is strongly drawn toward the outside of the block copolymer film (102) and self-assembly is accelerated. Consequently, the throughput of pattern formation by the self-assembly of the block copolymer film (102) is improved.
Inventors:
ENDOU, Masayuki (())
遠藤政孝 (())
遠藤政孝 (())
Application Number:
JP2009/004217
Publication Date:
May 20, 2010
Filing Date:
August 28, 2009
Export Citation:
Assignee:
PANASONIC CORPORATION (1006, Oaza Kadoma Kadoma-sh, Osaka 01, 〒5718501, JP)
パナソニック株式会社 (〒01 大阪府門真市大字門真１００６番地 Osaka, 〒5718501, JP)
ENDOU, Masayuki (())
パナソニック株式会社 (〒01 大阪府門真市大字門真１００６番地 Osaka, 〒5718501, JP)
ENDOU, Masayuki (())
International Classes:
B29C71/02; B82B3/00; C08J7/00; H01L21/027
Attorney, Agent or Firm:
MAEDA, Hiroshi et al. (Osaka-Marubeni Bldg, 5-7Hommachi 2-chome, Chuo-ku, Osaka-sh, Osaka 53, 〒5410053, JP)