Title:
METHOD FOR ADJUSTING ELECTRON BEAM PLOTTING DEVICE AND METHOD FOR ADJUSTING CONTROL DEVICE FOR CONTROLLING ELECTRON BEAM PLOTTING DEVICE
Document Type and Number:
WIPO Patent Application WO/2010/023751
Kind Code:
A1
Abstract:
An electron beam plotting device to be adjusted is caused to plot a predetermined test pattern. According to an image expressing the plotted test pattern, correction data for correcting a control amount of a plotting control unit is generated in the electron beam plotting device. According to the correction data, the control amount of the plotting control unit is corrected in the electron beam plotting device.
Inventors:
SUZUKI HIROAKI (JP)
FUKUSHIMA AKIO (JP)
KASUYA TAKAYUKI (JP)
SUGIURA SATOSHI (JP)
FUKUSHIMA AKIO (JP)
KASUYA TAKAYUKI (JP)
SUGIURA SATOSHI (JP)
Application Number:
PCT/JP2008/065506
Publication Date:
March 04, 2010
Filing Date:
August 29, 2008
Export Citation:
Assignee:
PIONEER CORP (JP)
SUZUKI HIROAKI (JP)
FUKUSHIMA AKIO (JP)
KASUYA TAKAYUKI (JP)
SUGIURA SATOSHI (JP)
SUZUKI HIROAKI (JP)
FUKUSHIMA AKIO (JP)
KASUYA TAKAYUKI (JP)
SUGIURA SATOSHI (JP)
International Classes:
G11B9/10
Foreign References:
| JPH09320945A | 1997-12-12 | |||
| JP2004005872A | 2004-01-08 |
Attorney, Agent or Firm:
FUJIMURA, Motohiko (JP)
Toson Motohiko (JP)
Toson Motohiko (JP)
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