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Title:
METHOD FOR ALIGNING NANO-SIZE MATERIALS IN ONE DIRECTION USING NANO-METER POLISHING, ELECTRIC DEVICE USING SAME AND METHOD FOR MANUFACTURING SAID ELECTRIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2014/077624
Kind Code:
A1
Abstract:
The present invention relates to a method for aligning nano-size materials in one direction using nano-meter polishing and to a method for manufacturing a device using the above-mentioned method. The present invention relates to a method for aligning nano-size materials in one direction using nano-meter polishing, in which scratches having nano-meter level width and depth are formed on the surface layer of a substrate in one direction and nano-size materials are aligned in the scratches so as to achieve superior electrical, mechanical or optical characteristics. The present invention also relates to a method for manufacturing an electric device using the above-mentioned method. The present invention provides a method for aligning nano-size materials in one direction using nano-meter polishing, comprising: a step (step 1) of forming scratches having a width of 0.1 to 20nm aligned in one direction in a substrate using a polishing device; and a step (step 2) of introducing and aligning nano-size materials in the substrate with the scratches formed therein.

Inventors:
CHOI WON JIN (KR)
LEE JEONG O (KR)
AN KI-SEOK (KR)
YANG CHEOL-SOO (KR)
PARK SE RIN (KR)
PARK DONG WOON (KR)
Application Number:
PCT/KR2013/010410
Publication Date:
May 22, 2014
Filing Date:
November 15, 2013
Export Citation:
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Assignee:
KOREA RES INST CHEM TECH (KR)
International Classes:
B82B3/00; H01L21/336
Foreign References:
KR100858223B12008-09-10
JP2008101271A2008-05-01
KR20100025836A2010-03-10
Other References:
LINGBO ZHU ET AL.: "Well -Aligned Open-Ended Carbon Nanotube Architectures: An Approach for Device Assembly", NANO LETT., vol. 6, 2006, pages 243 - 247
Attorney, Agent or Firm:
LEE, Won-Hee (642-16 Yoksam-dongKangnam-ku, Seoul 135-080, KR)
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