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Patent Searching and Data


Title:
METHOD AND APPARATUS FOR CLEANING SEMICONDUCTOR WAFER
Document Type and Number:
WIPO Patent Application WO/2019/047140
Kind Code:
A1
Abstract:
Provided are an apparatus and a method which ensure the wafers immersing in the chemical solution from one cleaning tank to the other cleaning tanks. The apparatus includes an inner tank (1001); at least one divider (1002) for dividing the inner tank (1001) into at least two cleaning tanks filled with chemical solution; a first robot (1005) equipped with at least a pair of end effectors (1051) for gripping and taking a wafer from a first cleaning tank (1011) to a second cleaning tank (1012); wherein each cleaning tank is provided with a cassette bracket (1003) in the bottom for holding wafers, and the at least one divider (1002) is provided with at least one slot (1004)< wherein the first robot (1005) grips and takes the wafer from the first cleaning tank (1011) to the second cleaning tank (1012) through the slot (1004) while keeping the wafer immersing.

Inventors:
WANG HUI (CN)
WANG XI (CN)
CHEN FUPING (CN)
Application Number:
PCT/CN2017/100983
Publication Date:
March 14, 2019
Filing Date:
September 08, 2017
Export Citation:
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Assignee:
ACM RES SHANGHAI INC (CN)
International Classes:
H01L21/67
Foreign References:
US5341825A1994-08-30
US4777970A1988-10-18
JPH08340035A1996-12-24
US4458703A1984-07-10
Attorney, Agent or Firm:
SHANGHAI PATENT & TRADEMARK LAW OFFICE, LLC (CN)
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