Title:
METHOD AND APPARATUS FOR FORMING FILM BY ALTERNATE DEPOSITION, AND FILM-COATED STRUCTURE
Document Type and Number:
WIPO Patent Application WO/2000/013806
Kind Code:
A1
Abstract:
A deposition apparatus comprises a first tank (100) that holds a solution including positively charged particles, a second tank (200) that holds a solution including negatively charged particles, and a robot arm (30) that supports a film-forming material (10). The robot arm (30) includes a quartz oscillator (20) having a unique oscillation frequency. A robot arm drive (40) moves the robot arm (30) by means of a mechanical drive means along the path shown with the broken line. A deposition controller (60) operates so that the robot arm (30) may enter the first tank (100) and the second tank (200) alternately. A frequency detector (50) detects the oscillation frequency of the quartz oscillator (20). The deposition controller (60) recognizes the thickness of thin film deposited in each tank based on the change in detected frequency (f) and decides the timing of the alternation of the first and second tanks. In this manner, accurate control of deposition can be achieved.
Inventors:
SHIRATORI SEIMEI (JP)
Application Number:
PCT/JP1999/004432
Publication Date:
March 16, 2000
Filing Date:
August 18, 1999
Export Citation:
Assignee:
SHIRATORI SEIMEI (JP)
International Classes:
B05D1/18; B05D1/00; (IPC1-7): B05D1/18; B05C3/09; B32B7/00; B32B31/00
Foreign References:
| JPH10100306A | 1998-04-21 | |||
| JPH05154433A | 1993-06-22 | |||
| JPS63252212A | 1988-10-19 | |||
| JPS6227860B2 | 1987-06-17 |
Other References:
KATSUHIKO ARIGA ET AL.: "Alternately Assembled Ultrathin Film of Silica Nanoparticles and Linear Polycations", CHEMISTRY LETTERS,, vol. 302, no. 2, February 1997 (1997-02-01), (TOKYO), pages 125 - 126, XP002926511
Attorney, Agent or Firm:
Shimura, Hiroshi (Minamikamata 2-chome Ohta-ku Tokyo, JP)
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