METHOD AND APPARATUS FOR MANUFACTURING MAGNETORESISTIVE DEVICE

Title:

METHOD AND APPARATUS FOR MANUFACTURING MAGNETORESISTIVE DEVICE

Document Type and Number:

WIPO Patent Application WO/2007/032379

Kind Code:

A1

Abstract:

Disclosed are a method and apparatus for manufacturing a magnetoresistive device which are suitable for manufacturing a high-quality magnetoresistive device by reducing damages caused during processing of a multilayer magnetic film as a component of the magnetoresistive device, thereby preventing deterioration of magnetic characteristics due to such damages. Specifically disclosed is a method for manufacturing a magnetoresistive device, which comprises a step for processing a multilayer magnetic film by performing a reactive ion etching on a substrate which is provided with the multilayer magnetic film as a component of the magnetoresistive device. This method for manufacturing a magnetoresistive device is characterized by comprising a step for irradiating the multilayer magnetic film with an ion beam after the reactive ion etching.

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Inventors:

WATANABE NAOKI (JP)
KODAIRA YOSHIMITSU (JP)
DJAYAPRAWIRA DAVID D (JP)
MAEHARA HIROKI (JP)

Application Number:

PCT/JP2006/318141

Publication Date:

March 22, 2007

Filing Date:

September 13, 2006

Export Citation:

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Assignee:

CANON ANELVA CORP (JP)
WATANABE NAOKI (JP)
KODAIRA YOSHIMITSU (JP)
DJAYAPRAWIRA DAVID D (JP)
MAEHARA HIROKI (JP)

International Classes:

H01L43/12; G11B5/39; H01L21/3065; H01L27/105; H01L43/08

Foreign References:

JP2003086861A	2003-03-20
JP2005042143A	2005-02-17
JP2001266566A	2001-09-28
JP2004250778A	2004-09-09

Other References: