METHOD AND APPARATUS FOR MANUFACTURING THIN FILM

WIPO Patent Application WO/2011/126039

A1

Disclosed is a method for manufacturing a thin film having a high film density using a spray film-forming method. The method for manufacturing a thin film sequentially includes: step of forming liquid droplets by spraying a raw material liquid, which has a solute dissolved and/or diffused in a solvent; a step of volatilizing and condensing the solvent in the liquid droplets; and a step of depositing the condensed liquid droplets on a substrate or on a thin film provided on the substrate. The method is characterized in depositing, at the same time on the substrate, the liquid droplets having liquid droplet diameters different from each other.

WO/2000/059622	METHOD FOR COATING PARTICLES
JP3961580	STEEL PANEL FOR LARGE-SIZED STRUCTURE ON WHICH PRIMARY RUST PREVENTING COATING FILM IS FORMED AND COATING OF STEEL PANEL FOR LARGE-SIZED STRUCTURE WITH PRIMARY RUST PREVENTING COATING MATERIAL
JP2011063794	WATER REPELLENCY TREATMENT AGENT FOR SPRAYING WITH HIGH PRESSURE, AND METHOD OF WATER REPELLENCY TREATMENT FOR VEHICLE SURFACE

OKI Kazuhiro (577 Ushijima, Kaisei-machi, Ashigarakami-gu, Kanagawa 77, 〒2588577, JP)
沖　和宏 (〒77 神奈川県足柄上郡開成町牛島５７７番地　富士フイルム株式会社内 Kanagawa, 〒2588577, JP)

JP2011/058680

October 13, 2011

April 06, 2011

Click for automatic bibliography generation  

FUJIFILM CORPORATION (26-30, Nishiazabu 2-chome Minato-k, Tokyo 31, 〒1060031, JP)
富士フイルム株式会社 (〒31 東京都港区西麻布２丁目２６番３０号 Tokyo, 〒1060031, JP)
OKI Kazuhiro (577 Ushijima, Kaisei-machi, Ashigarakami-gu, Kanagawa 77, 〒2588577, JP)

B05D1/02; B05B13/00; H01L51/50; H05B33/10

SIKs & Co. (8th Floor, Kyobashi-Nisshoku Bldg. 8-7, Kyobashi 1-chome, Chuo-k, Tokyo 31, 〒1040031, JP)

View/Download PDF      PDF Help

Previous Patent: POLYAMIDE RESIN COMPOSITION AND METHOD FOR PRODUCING POLYAMIDE RESIN COMPOSITION

Next Patent: PTC ELEMENT AND HEATING-ELEMENT MODULE