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Title:
METHOD AND APPARATUS FOR PATTERN FIDELITY CONTROL
Document Type and Number:
WIPO Patent Application WO/2018/114246
Kind Code:
A3
Abstract:
A method of topography determination, the method including: obtaining a first focus value derived from a computational lithography model modeling patterning of an unpatterned substrate or derived from measurements of a patterned layer on an unpatterned substrate; obtaining a second focus value derived from measurement of a substrate having a topography; and determining a value of the topography from the first and second focus values.

Inventors:
HASAN TANBIR (US)
JAIN VIVEK (US)
HUNSCHE STEFAN (US)
LA FONTAINE BRUNO (US)
Application Number:
PCT/EP2017/080704
Publication Date:
August 09, 2018
Filing Date:
November 28, 2017
Export Citation:
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Assignee:
ASML NETHERLANDS BV (NL)
International Classes:
G03F7/20; G03F9/00
Foreign References:
US20090262320A12009-10-22
US20150015870A12015-01-15
US20160154922A12016-06-02
US20120194792A12012-08-02
US20080131796A12008-06-05
US20040239905A12004-12-02
US20130065328A12013-03-14
Attorney, Agent or Firm:
PETERS, John (NL)
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