Title:
METHOD AND APPARATUS FOR PLASMA GENERATION
Document Type and Number:
WIPO Patent Application WO2005017943
Kind Code:
A3
Abstract:
An RF-driven plasma source, including a pair of spaced-apart plasma electrodes, wherein the electrodes act as plates of a capacitor, the gas electrically discharges and creates a plasma of both positive and negative ions, in a clean process that enables efficient sample analysis, with preferred isolated sample photo-ionization, reduced-power operation and also including signal detection with modulated drive electronics.
Inventors:
MILLER RAANAN A (US)
NAZAROV ERKINJON G (US)
KRYLOV EVGENY (US)
EICEMAN GARY A (US)
WRIGHT JOHN A (US)
KENDIG STEPHEN D (US)
MORRIS JAMES C (US)
CAMERON DOUGLAS B (US)
NAZAROV ERKINJON G (US)
KRYLOV EVGENY (US)
EICEMAN GARY A (US)
WRIGHT JOHN A (US)
KENDIG STEPHEN D (US)
MORRIS JAMES C (US)
CAMERON DOUGLAS B (US)
Application Number:
PCT/US2004/023217
Publication Date:
August 04, 2005
Filing Date:
July 19, 2004
Export Citation:
Assignee:
SIONEX CORP (US)
MILLER RAANAN A (US)
NAZAROV ERKINJON G (US)
KRYLOV EVGENY (US)
EICEMAN GARY A (US)
WRIGHT JOHN A (US)
KENDIG STEPHEN D (US)
MORRIS JAMES C (US)
CAMERON DOUGLAS B (US)
MILLER RAANAN A (US)
NAZAROV ERKINJON G (US)
KRYLOV EVGENY (US)
EICEMAN GARY A (US)
WRIGHT JOHN A (US)
KENDIG STEPHEN D (US)
MORRIS JAMES C (US)
CAMERON DOUGLAS B (US)
International Classes:
H01J27/24; H01J49/10; H01J49/16; H01J49/40; H01J49/42; H01J61/68; H01J61/90; (IPC1-7): H01J49/10; H01J27/24; H01J49/16; H01J49/40; H01J49/42; H01J61/68; H01J61/90
Foreign References:
| US6509562B1 | 2003-01-21 |
Download PDF:
Previous Patent: HIGH-FREQUENCY EXCITATION SYSTEM COMPRISING A LIMITING CIRCUIT
Next Patent: LOW-PRESSURE MERCURY VAPOR DISCHARGE LAMP
Next Patent: LOW-PRESSURE MERCURY VAPOR DISCHARGE LAMP