METHOD AND APPARATUS FOR POLISHING PLATE-LIKE MATERIAL

WIPO Patent Application WO/2011/074615

A1

Disclosed is a polishing method having improved operation efficiency in a polishing step without being affected by generation state of surface defects (17) on a glass plate (G) surface to be polished. The distribution state of the surface defects (17) of the glass plate (G) sucked to a suction sheet (3) on a table (2) is previously inspected, said distribution being in the Y axis direction within the surface, more polishing heads (5) that polish the surface of the glass plate (G) are disposed in a polishing lane (LB), which is a region where more surface defects (17) are present compared with a polishing lane (LA), i.e., a region having less surface defects (17), and the surface of the glass plate (G) is polished by moving the glass plate in the X axis direction.

ISHIMARU Naohiko (Limited. 12-1, Yurakucho 1-chome, Chiyoda-k, Tokyo 05, 〒1008405, JP)
石丸　直彦 (〒05 東京都千代田区有楽町一丁目１２番１号　旭硝子株式会社内 Tokyo, 〒1008405, JP)
KIYAMA Atsushi (Limited. 12-1, Yurakucho 1-chome, Chiyoda-k, Tokyo 05, 〒1008405, JP)

JP2010/072587

June 23, 2011

December 15, 2010

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Asahi Glass Company, Limited. (12-1, Yurakucho 1-chome Chiyoda-k, Tokyo 05, 〒1008405, JP)
旭硝子株式会社 (〒05 東京都千代田区有楽町一丁目１２番１号 Tokyo, 〒1008405, JP)
ISHIMARU Naohiko (Limited. 12-1, Yurakucho 1-chome, Chiyoda-k, Tokyo 05, 〒1008405, JP)
石丸　直彦 (〒05 東京都千代田区有楽町一丁目１２番１号　旭硝子株式会社内 Tokyo, 〒1008405, JP)

B24B7/06; B24B7/24; B24B27/033; B24B29/00

OGURI Shohei et al. (Eikoh Patent Firm, Toranomon East Bldg. 10F 7-13, Nishi-Shimbashi 1-chome, Minato-k, Tokyo 03, 〒1050003, JP)

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