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Patent Searching and Data


Title:
METHOD AND APPARATUS FOR PRODUCING FILM HAVING FINE SURFACE STRUCTURE
Document Type and Number:
WIPO Patent Application WO/2011/149004
Kind Code:
A1
Abstract:
Disclosed are a method and apparatus for producing a film having a fine surface structure, which comprises: a step wherein a film is intermittently supplied to a mold having a surface which is provided with grooves extending in two directions that are perpendicular to each other; a step wherein the film is brought into contact with and pressed against the mold so that the surface of the film is provided with a shape that corresponds to the shape of the mold surface; and a mold release step wherein the film adhering to the mold surface after the molding is separated therefrom. The method and apparatus for producing a film having a fine surface structure are characterized in that the two directions of the grooves of the mold perpendicular to each other are generally identical to the travel direction and the width direction of the film and the film separating direction in the mold release step is at an angle of 15-75 degrees with respect to the travel direction of the film. Consequently, defects and yield decrease due to mold releasing can be suppressed when the fine structure of the mold surface is transferred/molded on the film surface and the film is conveyed after being released from the mold after the molding.

Inventors:
MINOURA KIYOSHI (JP)
NOMURA FUMIYASU (JP)
HIRATA HAJIME (JP)
Application Number:
PCT/JP2011/062053
Publication Date:
December 01, 2011
Filing Date:
May 26, 2011
Export Citation:
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Assignee:
TORAY INDUSTRIES (JP)
TORAY ENG CO LTD (JP)
MINOURA KIYOSHI (JP)
NOMURA FUMIYASU (JP)
HIRATA HAJIME (JP)
International Classes:
B29C59/02; B29L7/00
Domestic Patent References:
WO2008142958A12008-11-27
Foreign References:
JP2008105407A2008-05-08
JP2007296683A2007-11-15
JP2007176038A2007-07-12
JP2010160854A2010-07-22
Attorney, Agent or Firm:
BAN Toshimitsu (JP)
Toshimitsu Ban (JP)
Download PDF:
Claims: