METHOD AND APPARATUS FOR TREATING EXHAUST GAS

Title:

METHOD AND APPARATUS FOR TREATING EXHAUST GAS

Document Type and Number:

WIPO Patent Application WO/2005/072852

Kind Code:

A1

Abstract:

A method for treating an exhaust gas, which comprises the steps of introducing an exhaust gas being in an exited state in a facility for manufacture of a semiconductor device into a plasma treatment portion of a treating section under a reduced pressure, introducing the exhaust gas being maintained in an exited state by a plasma generating in the plasma treatment portion into a reactor in a removal reaction section, reacting the exhaust gas with a removing reaction agent comprised of particulate calcium oxide packed in the reactor and removing harmful gas components in the exhaust gas. The method may further include the step of supplying oxygen into the plasma treatment portion so as to subject the harmful gas components to oxidation decomposition in the presence of a plasma and then reacting the decomposed gas components with the removing reaction agent.

Inventors:

OHMI TADAHIRO (JP)
HASEGAWA HIDEHARU (JP)
ISHIHARA YOSHIO (JP)
SUZUKI KATSUMASA (JP)

Application Number:

PCT/JP2005/000897

Publication Date:

August 11, 2005

Filing Date:

January 25, 2005

Export Citation:

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Assignee:

TAIYO NIPPON SANSO CORP (JP)
OHMI TADAHIRO (JP)
HASEGAWA HIDEHARU (JP)
ISHIHARA YOSHIO (JP)
SUZUKI KATSUMASA (JP)

International Classes:

B01D53/68; B01J3/00; B01J19/08; B01J19/12; (IPC1-7): B01D53/68; B01J3/00; B01J19/08; B01J19/12

Foreign References:

JPH04265113A	1992-09-21
JP2002153729A	2002-05-28
JPH04200617A	1992-07-21

Other References: