Title:
METHOD FOR APPLYING PHOTOCURABLE RESIN FOR PREVENTING BUBBLE GENERATION WHEN MANUFACTURING LARGE-AREA POLYMER DISPERSED LIQUID CRYSTAL PANEL
Document Type and Number:
WIPO Patent Application WO/2021/235630
Kind Code:
A1
Abstract:
The present invention relates to a method for manufacturing a large-area polymer dispersed liquid crystal (PDLC) panel, and more particularly, to an application method for preventing bubble generation in a photocurable resin applying step. By applying the photocurable resin in a specific pattern, or by manufacturing same under specific conditions, bubbles generated between a PDLC film and a substrate can be completely eliminated or significantly reduced, while at the same time minimizing the amount of photocurable resin used and thereby obtaining economical effects.
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Inventors:
PARK WOO GEUN (KR)
CHOI SOON JIN (KR)
CHOI SANG DAE (KR)
KIM SONG TAE (KR)
HAN JUN HEE (KR)
KIM JAE JIN (KR)
CHOI SOON JIN (KR)
CHOI SANG DAE (KR)
KIM SONG TAE (KR)
HAN JUN HEE (KR)
KIM JAE JIN (KR)
Application Number:
PCT/KR2020/016583
Publication Date:
November 25, 2021
Filing Date:
November 23, 2020
Export Citation:
Assignee:
SUNGILINNOTECH CO LTD (KR)
International Classes:
G02F1/1339; B32B17/10; B32B27/30; B32B37/02; B32B37/12; G02F1/13; G02F1/1334
Foreign References:
| KR20180107920A | 2018-10-04 | |||
| KR20110063552A | 2011-06-10 | |||
| KR20130044516A | 2013-05-03 | |||
| KR101984768B1 | 2019-05-31 | |||
| KR20060067449A | 2006-06-20 | |||
| KR101467734B1 | 2014-12-01 | |||
| KR20180045750A | 2018-05-04 | |||
| KR102138031B1 | 2020-07-27 |
Attorney, Agent or Firm:
IPCJ PATENT & LAW FIRM (KR)
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