Title:
METHOD FOR APPLYING A RESIST LAYER, USES OF ADHESIVE MATERIALS, AND ADHESIVE MATERIALS AND A RESIST LAYER
Document Type and Number:
WIPO Patent Application WO2004059393
Kind Code:
A3
Abstract:
The invention relates to a method wherein a resist layer (12) is applied to a base layer (24). The resist layer (12) is made of an adhesive material, the adhesive force thereof either reducing or increasing during radiation. Removal of residue of the resist layer (12) is made easier due to said method.
Inventors:
KROENINGER WERNER (DE)
SCHNEEGANS MANFRED (DE)
SCHNEEGANS MANFRED (DE)
Application Number:
PCT/EP2003/014460
Publication Date:
April 07, 2005
Filing Date:
December 18, 2003
Export Citation:
Assignee:
INFINEON TECHNOLOGIES AG (DE)
KROENINGER WERNER (DE)
SCHNEEGANS MANFRED (DE)
KROENINGER WERNER (DE)
SCHNEEGANS MANFRED (DE)
International Classes:
G03F7/16; G03F7/32; G03F7/34; (IPC1-7): G03F7/16; G03F7/32; G03F7/34; G03F7/42
Foreign References:
US4289841A | 1981-09-15 | |||
US3469982A | 1969-09-30 | |||
US5015059A | 1991-05-14 | |||
US4826705A | 1989-05-02 | |||
EP0559248A1 | 1993-09-08 | |||
US6100006A | 2000-08-08 | |||
EP0553638A1 | 1993-08-04 | |||
US4649100A | 1987-03-10 | |||
US5959011A | 1999-09-28 |
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