METHOD FOR CALCULATING RONCHI SHEAR INTERFERENCE IMAGE IN PHOTOLITHOGRAPHY PROJECTION OBJECTIVE

WIPO Patent Application WO/2022/083735

A1

A method for calculating a Ronchi shear interference image in a photolithography projection objective (2). In the method, a strict photolithography vector model is used for calculation during the process of transmitting light, emitted by a light source, from an object-side grating (1) to an image-side grating (3). The method can also be suitable for object-side and image-side gratings in any shape. In addition, a strict Rayleigh-Sommerfeld diffraction integral is used for calculation during the process of transmitting light from the image-side grating (3) to a receiving screen (4). In the method for calculating a Ronchi shear interference image in a photolithography projection objective (2), since a strict photolithography vector model and Rayleigh-Sommerfeld diffraction integral are used for calculation, there is no need to take near fields or far fields of object-side and image-side gratings (1, 3) into consideration, and there is also no need to take factors such as paraxial approximation into consideration with regard to the receiving screen (4), thereby avoiding the problem of it being difficult to accurately obtain a shear interference image due to a large limitation of a traditional test method.

NIU ZHIYUAN (CN)
SHI WEIJIE (CN)

PCT/CN2021/125704

April 28, 2022

October 22, 2021

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DONGFANG JINGYUAN ELECTRON LTD SHENZHEN BRANCH (CN)

G03F7/20; G01J9/02

CN112114501A	2020-12-22
CN102681365A	2012-09-19
CN102889980A	2013-01-23
CN104111120A	2014-10-22
CN107367906A	2017-11-21
JPS59116522A	1984-07-05

SHENZHEN I&W INTELLECTUAL PROPERTY CORPORATION (CN)

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