Title:
METHOD OF CONTINUOUSLY PRODUCING TETRAFLUOROSILANE BY USING VARIOUS FLUORINATED MATERIALS, AMORPHOUS SILICA AND SULFURIC ACID
Document Type and Number:
WIPO Patent Application WO/2011/155666
Kind Code:
A1
Abstract:
The present invention relates to a method of continuously producing tetrafluorosilane (SiF4) by using various fluorinated materials, amorphous silica (SiO2) and sulfuric acid (H2SO4). According to the present invention, the yield of tetrafluorosilane can increase and it can be continuously produced in an environmentally friendly manner with low cost. In addition, the amount of hydrogen fluoride generated during the reaction is minimized and thus the corrosion of devices can be minimized, and the pipeline blockage and yield decrease of SiF4 can be prevented by passing the reaction product which is a mixture gas of SiF4 and water through an H2SO4 scrubber at a high temperature to remove water, which can prevent the generation of silica gel and hexafluorosilicic acid by the side-reaction of condensed water and SiF4.
Inventors:
KANG KYUNG HOON (KR)
CHO YEON SEOK (KR)
KIM SE JONG (KR)
CHO YEON SEOK (KR)
KIM SE JONG (KR)
Application Number:
PCT/KR2010/006136
Publication Date:
December 15, 2011
Filing Date:
September 09, 2010
Export Citation:
Assignee:
KCC CORP (KR)
KANG KYUNG HOON (KR)
CHO YEON SEOK (KR)
KIM SE JONG (KR)
KANG KYUNG HOON (KR)
CHO YEON SEOK (KR)
KIM SE JONG (KR)
International Classes:
C01B33/107
Domestic Patent References:
| WO1994001364A1 | 1994-01-20 | |||
| WO2005030642A1 | 2005-04-07 |
Foreign References:
| JP2005035820A | 2005-02-10 | |||
| KR20080070813A | 2008-07-31 | |||
| US3087787A | 1963-04-30 | |||
| KR20060107738A | 2006-10-16 | |||
| KR20040013138A | 2004-02-11 | |||
| US2615872A | 1952-10-28 | |||
| US4382071A | 1983-05-03 | |||
| US6770253B2 | 2004-08-03 |
Attorney, Agent or Firm:
CHOI, Kyu Pal (824-11 Yeoksam-dong, Kangnam-gu, Seoul 135-080, KR)
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Claims: