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Patent Searching and Data


Title:
METHOD OF CREATING TEMPLATE FOR MATCHING, AS WELL AS DEVICE FOR CREATING TEMPLATE
Document Type and Number:
WIPO Patent Application WO/2011/013317
Kind Code:
A1
Abstract:
Disclosed is a method wherein a template for template matching is created with high accuracy and high efficiency. With respect to each individual pattern constituting a basic circuit, pattern information regarding a plurality of layers in a semiconductor device is memorized in a library. On the basis of the designation of the position and the layer, pattern information regarding the designated position and layer is extracted from the pattern information memorized in the aforementioned library. A template is created on the basis of the above-mentioned pattern information extracted.

Inventors:
MATSUOKA, Ryoichi (HITACHI HIGH-TECHNOLOGIES CORPORATION 882, Oaza Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
松岡良一 (〒04 茨城県ひたちなか市大字市毛882番地 株式会社 日立ハイテクノロジーズ 那珂事業所内 Ibaraki, 〒3128504, JP)
SUGIYAMA, Akiyuki (HITACHI HIGH-TECHNOLOGIES CORPORATION 882, Oaza Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
Application Number:
JP2010/004588
Publication Date:
February 03, 2011
Filing Date:
July 15, 2010
Export Citation:
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Assignee:
HITACHI HIGH-TECHNOLOGIES CORPORATION (24-14, Nishi Shimbashi 1-chome Minato-k, Tokyo 17, 〒1058717, JP)
株式会社 日立ハイテクノロジーズ (〒17 東京都港区西新橋一丁目24番14号 Tokyo, 〒1058717, JP)
MATSUOKA, Ryoichi (HITACHI HIGH-TECHNOLOGIES CORPORATION 882, Oaza Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
松岡良一 (〒04 茨城県ひたちなか市大字市毛882番地 株式会社 日立ハイテクノロジーズ 那珂事業所内 Ibaraki, 〒3128504, JP)
International Classes:
G01B15/04; G01N23/225; H01L21/66
Attorney, Agent or Firm:
INOUE, Manabu et al. (6-1, Marunouchi 1-chome, Chiyoda-k, Tokyo 20, 〒1008220, JP)
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