Title:
METHOD FOR DEPOSITING NANOSTRUCTURES ON SUBSTRATE AND NANOSTRUCTURE ARRAYS
Document Type and Number:
WIPO Patent Application WO/2021/197322
Kind Code:
A1
Abstract:
A method for depositing nanostructures on a substrate comprises: forming a patterned alignment layer on a surface of the substrate, wherein the patterned alignment layer has one or more cavities each having a main region for accommodating at least one template nanostructure therein and a plurality of extension regions extending from the main region and in fluid communication with the main region, and wherein the plurality of extension regions are sized and shaped to not accommodate the at least one template nanostructure; and diffusing template nanostructures into the one or more cavities of the patterned alignment layer.
Inventors:
SUN WEI (CN)
CHEN YAHONG (CN)
CHEN YAHONG (CN)
Application Number:
PCT/CN2021/083941
Publication Date:
October 07, 2021
Filing Date:
March 30, 2021
Export Citation:
Assignee:
UNIV BEIJING (CN)
International Classes:
H01L21/02; B82B1/00; B82B3/00
Foreign References:
| KR20070112733A | 2007-11-27 | |||
| CN105793956A | 2016-07-20 | |||
| US20100239488A1 | 2010-09-23 | |||
| US20180348629A1 | 2018-12-06 |
Attorney, Agent or Firm:
JUN HE LAW OFFICES (CN)
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