Title:
METHOD FOR DESALTING TREATMENT OF CHLORINE-CONTAINING POWDER
Document Type and Number:
WIPO Patent Application WO/2023/100541
Kind Code:
A1
Abstract:
Provided is a method for a desalting treatment of a chlorine-containing powder, whereby it becomes possible to effectively reduce the amount of water to be used in the entire system. The method for a desalting treatment of a chlorine-containing powder is configured such that a slurrying step, a chlorine elution step, a desalted cake formation step, a first desalted cake washing step and a second desalted cake washing step are repeated for each chlorine-containing powder to be supplied, in which at least a portion of a third filtrate obtained in the second desalted cake washing step is collected and stored, and is reused as a wash solution for second desalting for the first desalted cake washing step or a wash solution for third desalting for the second desalted cake washing step or both of the wash solutions for a chlorine-containing powder to be supplied in a subsequent stage, and is used circulatively as a wash solution for first desalting for the slurrying step after one reuse or a plurality of reuses.
Inventors:
NIIJIMA SHUN (JP)
SENGOKU TAIYO (JP)
SENGOKU TAIYO (JP)
Application Number:
PCT/JP2022/039835
Publication Date:
June 08, 2023
Filing Date:
October 26, 2022
Export Citation:
Assignee:
TAIHEIYO CEMENT CORP (JP)
International Classes:
F23J1/00; B08B3/04; B09B3/70; C02F11/00; C02F11/122; C02F11/123
Domestic Patent References:
| WO2020053944A1 | 2020-03-19 |
Foreign References:
| JP2003211129A | 2003-07-29 | |||
| CN112047547A | 2020-12-08 | |||
| JP2009090172A | 2009-04-30 | |||
| JP2008264768A | 2008-11-06 | |||
| JP2013095605A | 2013-05-20 | |||
| CN212334622U | 2021-01-12 |
Attorney, Agent or Firm:
SATO & ASSOCIATES (JP)
Download PDF:
Previous Patent: NITRIDE SEMICONDUCTOR SUBSTRATE AND METHOD FOR PRODUCING SAME
Next Patent: CAP DEVICE, CAPPING METHOD, AND LIQUID EJECTION SYSTEM
Next Patent: CAP DEVICE, CAPPING METHOD, AND LIQUID EJECTION SYSTEM