Title:
METHOD FOR DESIGN AND MANUFACTURE OF A RETICLE USING A TWO-DIMENSIONAL DOSAGE MAP AND CHARGED PARTICLE BEAM LITHOGRAPHY
Document Type and Number:
WIPO Patent Application WO/2010/025061
Kind Code:
A3
Abstract:
In the field of semiconductor device production, a method for manufacturing a surface using two-dimensional dosage maps is disclosed. A set of charged particle beam shots for creating an image on the surface is determined by combining dosage maps for a plurality of shots into the dosage map for the surface. A similar method is disclosed for fracturing or mask data preparation of a reticle image. A method for creating glyphs is also disclosed, in which a two-dimensional dosage map of one or more shots is calculated, and the list of shots and the calculated dosage map are stored for later reference.
Inventors:
FUJIMURA AKIRA (US)
ZABLE HAROLD ROBERT (US)
ZABLE HAROLD ROBERT (US)
Application Number:
PCT/US2009/054239
Publication Date:
May 14, 2010
Filing Date:
August 19, 2009
Export Citation:
Assignee:
D2S INC (US)
FUJIMURA AKIRA (US)
ZABLE HAROLD ROBERT (US)
FUJIMURA AKIRA (US)
ZABLE HAROLD ROBERT (US)
International Classes:
H01L21/027; G03F7/20
Foreign References:
| US20070114453A1 | 2007-05-24 | |||
| US20070187624A1 | 2007-08-16 |
Attorney, Agent or Firm:
MUELLER, Heather et al. (P.C.12951 Harwick Lan, San Diego CA, US)
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