Title:
METHOD OF DETERMINING THE CORRECT AVERAGE BIAS COMPENSATION VOLTAGE DURING A PLASMA PROCESS
Document Type and Number:
WIPO Patent Application WO2006004744
Kind Code:
A3
Abstract:
A method for removing a substrate that is attached to a bipolar electrostatic chuck (ESC) by application of a bipolar ESC voltage is provided which includes discontinuing the bipolar ESC voltage after processing a current substrate, and determining a monopolar component error of the processing. The method also includes correcting the monopolar component error for a subsequent substrate.
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Inventors:
HOWALD ARTHUR M (US)
Application Number:
PCT/US2005/022914
Publication Date:
June 08, 2006
Filing Date:
June 28, 2005
Export Citation:
Assignee:
LAM RES CORP (US)
HOWALD ARTHUR M (US)
HOWALD ARTHUR M (US)
International Classes:
H02H1/00; H01L21/683
Foreign References:
| US5880924A | 1999-03-09 | |||
| US5818682A | 1998-10-06 | |||
| US5103367A | 1992-04-07 | |||
| US5612850A | 1997-03-18 | |||
| US5874361A | 1999-02-23 | |||
| US5117121A | 1992-05-26 |
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