Title:
METHOD FOR DETERMINING RELATIVE SWING CURVE AMPLITUDE
Document Type and Number:
WIPO Patent Application WO2005038529
Kind Code:
A3
Abstract:
A process (300) is disclosed to measure predetermined wavelength reflectance spectra of a photo resist coated wafer (305,310,315,320) at a nominal thickness. After coating, the predetermined wavelength reflectance (325,330) is measured and the peak heights and valleys in the vicinity of the predetermined wavelength are tabulated. The relative swing ratio is computed (335) as the average peak height of the spectra at the exposure wavelength. This relative swing ratio is then compared to similar computations on other processes to determine which provides the best critical dimension (CD) control.
More Like This:
| WO/2022/248217 | DETERMINING MASK RULE CHECK VIOLATIONS AND MASK DESIGN |
| JP2000294500 | PERIPHERAL EXPOSURE DEVICE AND THE METHOD |
| JP2005265963 | PHOTOMASK AND SET OF THE PHOTOMASKS |
Inventors:
ZIGER DAVID (US)
Application Number:
PCT/IB2004/052145
Publication Date:
July 07, 2005
Filing Date:
October 19, 2004
Export Citation:
Assignee:
KONINKL PHILIPS ELECTRONICS NV (NL)
ZIGER DAVID (US)
ZIGER DAVID (US)
International Classes:
G03F7/20; (IPC1-7): G03F7/20
Foreign References:
| US4308586A | 1981-12-29 | |||
| EP0727715A1 | 1996-08-21 | |||
| EP0973068A2 | 2000-01-19 | |||
| US20020012876A1 | 2002-01-31 |
Other References:
INTERNATIONAL BUSINESS MACHINES CORPORATION: "In-situ exposure tool monitor", RESEARCH DISCLOSURE, KENNETH MASON PUBLICATIONS, HAMPSHIRE, GB, vol. 426, no. 88, October 1999 (1999-10-01), XP007124945, ISSN: 0374-4353
SINGH B ET AL: "IC wafer reflectivity measurement in the UV and DUV and its application for ARC characterization", PROCEEDINGS OF THE SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING USA, vol. 1926, 2 March 1993 (1993-03-02), pages 151 - 163, XP009042684, ISSN: 0277-786X
GAMSKY C J ET AL: "Quantitative analysis of chemically amplified negative photoresist using mirror-backed infrared reflection absorption spectroscopy", PROCEEDINGS OF THE SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING USA, vol. 2438, 20 February 1995 (1995-02-20), pages 143 - 152, XP009042685, ISSN: 0277-786X
SINGH B ET AL: "IC wafer reflectivity measurement in the UV and DUV and its application for ARC characterization", PROCEEDINGS OF THE SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING USA, vol. 1926, 2 March 1993 (1993-03-02), pages 151 - 163, XP009042684, ISSN: 0277-786X
GAMSKY C J ET AL: "Quantitative analysis of chemically amplified negative photoresist using mirror-backed infrared reflection absorption spectroscopy", PROCEEDINGS OF THE SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING USA, vol. 2438, 20 February 1995 (1995-02-20), pages 143 - 152, XP009042685, ISSN: 0277-786X
Download PDF:
Previous Patent: METHOD OF COATING A MULTILAYERED ELEMENT
Next Patent: THINNER COMPOSITION FOR REMOVING PHOTORESIST
Next Patent: THINNER COMPOSITION FOR REMOVING PHOTORESIST