Title:
METHOD AND DEVICE FOR DRYING PHOTORESIST COATINGS
Document Type and Number:
WIPO Patent Application WO1999059191
Kind Code:
A3
Abstract:
The present invention relates to a method and device for drying photoresist coatings. A substrate (12) provided with the photoresist coating is impinged upon by infrared radiation from an infrared radiation source (4) with an adjustable output. The temperature of the area around the photresist layer is measured during drying. The output of the infrared radiation source is temperature-controlled so as to achieve a specific chronological temperature cycle. For this purpose, the inventive device is provided with a control unit (8) and a temperature measuring device (6, 7). The inventive method and device pertaining thereto enable especially thick photoresist coatings (>/=20 mu m) to be dried in an optimum manner over a short period of time. The photoresist mask that is subsequently produced has a high resolution.
Inventors:
LOECHEL BERND (DE)
MACIOSSEK ANDREAS (DE)
BLEIDIESSEL GERHARD (DE)
WILBERS WILHELMUS (NL)
MACIOSSEK ANDREAS (DE)
BLEIDIESSEL GERHARD (DE)
WILBERS WILHELMUS (NL)
Application Number:
PCT/DE1999/001485
Publication Date:
August 23, 2001
Filing Date:
May 12, 1999
Export Citation:
Assignee:
FRAUNHOFER GES FORSCHUNG (DE)
LOECHEL BERND (DE)
MACIOSSEK ANDREAS (DE)
BLEIDIESSEL GERHARD (DE)
WILBERS WILHELMUS (NL)
LOECHEL BERND (DE)
MACIOSSEK ANDREAS (DE)
BLEIDIESSEL GERHARD (DE)
WILBERS WILHELMUS (NL)
International Classes:
F26B3/30; F26B25/00; H01L21/00; H01L21/027
Foreign References:
| US5705232A | 1998-01-06 | |||
| US5166523A | 1992-11-24 | |||
| US5540782A | 1996-07-30 | |||
| DE19516193A1 | 1995-11-16 | |||
| US4926567A | 1990-05-22 |
Other References:
PATENT ABSTRACTS OF JAPAN vol. 013, no. 016 (E - 703) 13 January 1989 (1989-01-13)
PATENT ABSTRACTS OF JAPAN vol. 012, no. 298 (P - 744) 15 August 1988 (1988-08-15)
BLEIDIESSEL G ET AL: "Dependence of the quality of thick resist structures on resist baking", MICROELECTRONIC ENGINEERING, vol. 41-42, 1 March 1998 (1998-03-01), pages 433-436, XP004111750, ISSN: 0167-9317
PATENT ABSTRACTS OF JAPAN vol. 018, no. 008 (E - 1486) 7 January 1994 (1994-01-07)
PATENT ABSTRACTS OF JAPAN vol. 012, no. 298 (P - 744) 15 August 1988 (1988-08-15)
BLEIDIESSEL G ET AL: "Dependence of the quality of thick resist structures on resist baking", MICROELECTRONIC ENGINEERING, vol. 41-42, 1 March 1998 (1998-03-01), pages 433-436, XP004111750, ISSN: 0167-9317
PATENT ABSTRACTS OF JAPAN vol. 018, no. 008 (E - 1486) 7 January 1994 (1994-01-07)
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