Title:
METHOD AND DEVICE FOR HIGH-TEMPERATURE COMBUSTION USING FUEL AND AQUEOUS SOLUTION OF ORGANIC COMPOUND
Document Type and Number:
WIPO Patent Application WO/2011/083877
Kind Code:
A1
Abstract:
A method and a device are disclosed with which high-temperature combustion is attained using a fuel and an aqueous solution of an organic compound, e.g., an aqueous alcohol solution.
In a combustion chamber, a fuel is sprayed and burned with a first burner to elevate the interior temperature of the combustion chamber (and/or a heat-resistant reflector disposed inside the combustion chamber) to a high temperature of 700ºC or above, and an aqueous solution of an organic compound (e.g., an alcohol-water mixture) is subsequently sprayed with a second burner into the high-temperature combustion gas obtained with the first burner, thereby causing microexplosion of water vapor and further elevating the interior temperature.
Thus, high-temperature superheated steam containing a large amount of water vapor is yielded.
Inventors:
ISHIGURO, Saburo (4-4-21, Hamadayama Suginami-k, Tokyo 65, 〒1680065, JP)
石黒三郎 (〒65 東京都杉並区浜田山４－４－２１ Tokyo, 〒1680065, JP)
ISHII, Yukio (10-9, Sugawara-cho Kawagoe-sh, Saitama 46, 〒3500046, JP)
石黒三郎 (〒65 東京都杉並区浜田山４－４－２１ Tokyo, 〒1680065, JP)
ISHII, Yukio (10-9, Sugawara-cho Kawagoe-sh, Saitama 46, 〒3500046, JP)
Application Number:
JP2011/050606
Publication Date:
July 14, 2011
Filing Date:
January 07, 2011
Export Citation:
Assignee:
IBS Co., Ltd. (2-10-1, Nihonbashi-hamacho Chuo-k, Tokyo 77, 〒1030077, JP)
株式会社アイ・ビー・エス (〒77 東京都中央区日本橋浜町２－１０－１ Tokyo, 〒1030077, JP)
ISHIGURO, Saburo (4-4-21, Hamadayama Suginami-k, Tokyo 65, 〒1680065, JP)
石黒三郎 (〒65 東京都杉並区浜田山４－４－２１ Tokyo, 〒1680065, JP)
株式会社アイ・ビー・エス (〒77 東京都中央区日本橋浜町２－１０－１ Tokyo, 〒1030077, JP)
ISHIGURO, Saburo (4-4-21, Hamadayama Suginami-k, Tokyo 65, 〒1680065, JP)
石黒三郎 (〒65 東京都杉並区浜田山４－４－２１ Tokyo, 〒1680065, JP)
International Classes:
F23C1/00; A62D3/40; F23C99/00; F23G7/04; F23L7/00; A62D101/22; A62D101/28
Attorney, Agent or Firm:
MURATA, Yukio (TOKYO-CHIZAI PATENT OFFICE, Kyobashi Kyodo Building 4th Floor 5-5, Kyobashi 1-chome, Chuo-k, Tokyo 31, 〒1040031, JP)
Download PDF:
Claims:
Previous Patent: CHANNEL ESTIMATION FOR OFDM SYSTEMS
Next Patent: METHOD FOR MANUFACTURING TIN ELECTROPLATED STEEL PLATE
Next Patent: METHOD FOR MANUFACTURING TIN ELECTROPLATED STEEL PLATE