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Title:
METHOD AND DEVICE FOR LIGHT-INDUCED OR LIGHT-SUPPORTED DEPOSITING OF METAL ON A SURFACE OF A SEMICONDUCTOR COMPONENT
Document Type and Number:
WIPO Patent Application WO/2014/029667
Kind Code:
A3
Abstract:
The invention relates to a method for light entrapment in coating baths, in order thereby to deposit metal on a surface of a semiconductor component in a light-induced or light-supported manner. The method comprises at least the following steps: A) providing the coating bath which contains a matrix and a radiation deflecting component or is made of same; B) introducing the at least one semiconductor component into the coating bath; C) carrying out the light-induced or light-supported deposition.

Inventors:
ZIMMER, Martin (Frankenweg 20, Freiburg, 79117, DE)
RENTSCH, Jochen (Erbsenreute 6, Emmendingen, 79312, DE)
SAVIO, Christian (Lehener Straße 66, Freiburg, 79106, DE)
KÖNIG, Clemens (N 68, Mannheim, Mannheim, 68161, DE)
Application Number:
EP2013/066920
Publication Date:
September 04, 2014
Filing Date:
August 13, 2013
Export Citation:
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Assignee:
FRAUNHOFER-GESELLSCH. Z. FÖRDERUNG D. ANGEW. FORSCHUNG E.V. (Hansastr. 27c, München, 80686, DE)
International Classes:
C23C18/16; B82Y30/00; C25D5/00; C25D7/12; C25D15/00; C25D17/00; H01L31/0224; H01L31/18; B82Y20/00
Domestic Patent References:
WO2010108996A12010-09-30
Foreign References:
US20070256937A12007-11-08
US20110132764A12011-06-09
US20100051091A12010-03-04
EP1403401A22004-03-31
US20090127567A12009-05-21
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