Title:
METHOD AND DEVICE FOR LIGHT-INDUCED OR LIGHT-SUPPORTED DEPOSITING OF METAL ON A SURFACE OF A SEMICONDUCTOR COMPONENT
Document Type and Number:
WIPO Patent Application WO/2014/029667
Kind Code:
A3
Abstract:
The invention relates to a method for light entrapment in coating baths, in order thereby to deposit metal on a surface of a semiconductor component in a light-induced or light-supported manner. The method comprises at least the following steps: A) providing the coating bath which contains a matrix and a radiation deflecting component or is made of same; B) introducing the at least one semiconductor component into the coating bath; C) carrying out the light-induced or light-supported deposition.
Inventors:
ZIMMER MARTIN (DE)
RENTSCH JOCHEN (DE)
SAVIO CHRISTIAN (DE)
KÖNIG CLEMENS (DE)
RENTSCH JOCHEN (DE)
SAVIO CHRISTIAN (DE)
KÖNIG CLEMENS (DE)
Application Number:
PCT/EP2013/066920
Publication Date:
September 04, 2014
Filing Date:
August 13, 2013
Export Citation:
Assignee:
FRAUNHOFER GESELLSCH Z FÖRDERUNG D ANGEW FORSCHUNG E V (DE)
International Classes:
C23C18/16; B82Y30/00; C25D5/00; C25D7/12; C25D15/00; C25D17/00; H01L31/0224; H01L31/18; B82Y20/00
Domestic Patent References:
| WO2010108996A1 | 2010-09-30 |
Foreign References:
| US20070256937A1 | 2007-11-08 | |||
| US20110132764A1 | 2011-06-09 | |||
| US20100051091A1 | 2010-03-04 | |||
| EP1403401A2 | 2004-03-31 | |||
| US20090127567A1 | 2009-05-21 |
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