METHOD AND DEVICE FOR PREDICTING STATE OF CHAMBER BY USING ARTIFICIAL NEURAL NETWORK

Title:

METHOD AND DEVICE FOR PREDICTING STATE OF CHAMBER BY USING ARTIFICIAL NEURAL NETWORK

Document Type and Number:

WIPO Patent Application WO/2024/005324

Kind Code:

A1

Abstract:

Embodiments of the present specification relate to a method and a device for predicting the state of a chamber provided in a semiconductor facility. In order to achieve the above task, a semiconductor facility failure prediction method according to one embodiment of the present specification comprises the steps of: obtaining chamber information regarding a plurality of chambers provided in a semiconductor facility; extracting a first input feature from the chamber information; inputting the first input feature into a learning model to estimate a first current corresponding to the chambers; and predicting the state of each of the chambers on the basis of the estimated first current.

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Inventors:

KIM MIN SU (KR)
CHO SUNG OH (KR)
KIM KI BEOM (KR)

Application Number:

PCT/KR2023/005121

Publication Date:

January 04, 2024

Filing Date:

April 14, 2023

Export Citation:

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Assignee:

HANWHA CORP (KR)

International Classes:

G05B23/02; G06N3/08; H01L21/67

Foreign References:

JP2022052062A	2022-04-04
US20210333785A1	2021-10-28
KR20150063184A	2015-06-09
JP2012018012A	2012-01-26
KR20110125366A	2011-11-21

Attorney, Agent or Firm:

Y.P.LEE, MOCK & PARTNERS (KR)

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