METHOD AND DEVICE FOR PROCESSING COMPONENTS

WIPO Patent Application WO1999065800

A3

The invention relates to a method and device for processing components, especially for spraying, coating or vapor-depositing components according to the following steps: The components (24) to be processed are fixed on a support device (22) inside a loading station (26) in a non-positive and/or positive manner; the components (24) fixed on a support device (22) are conveyed to a processing device (30) by a transport device (12); during this, the transport speed of the transport device (12) is adjusted and controlled; the component (24) which is immediately due to be processed and which is located in front of the processing device (30) each time is detected by a component identification (32) and is reported to the processing station (30) by signal; upon which, the processing station (30) is started and the component (24) located in the processing station (30) is processed in a time-controlled automatic manner; after the adjusted processing period has lapsed, the processing station (30) is stopped, and the processed component (24) is conveyed to an unloading station (28) by a transport device (12) where it is removed from the support device (22).

JP4630104	Substrate proximity processing structure and its use and manufacturing method
JP2004519542	Photodegradation resistant electrodeposition coating compositions and related processes

EISSFELLER ROMAN (DE)
SCHLENKER DIETER (DE)

PCT/EP1999/004162

March 09, 2000

June 16, 1999

Click for automatic bibliography generation  

EISSFELLER ROMAN (DE)
SCHLENKER DIETER (DE)

B05D1/00; B25J9/00; B65G43/08; B65G49/00; B65G49/02; C23C14/56; G05B19/42; B65G; (IPC1-7): G05B19/42; B25J9/00

DE1962559A1	1970-07-09
US4743819A	1988-05-10

View/Download PDF      PDF Help

Previous Patent: METHOD AND DEVICE FOR SUPPRESSING ESCAPE OF VOLATILE COMPOUNDS

Next Patent: RETURN DEVICE