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Title:
METHOD AND DEVICE FOR PROCESSING PFC
Document Type and Number:
WIPO Patent Application WO/2001/068224
Kind Code:
A1
Abstract:
A method and device for processing PFC, in which a vacuum pump is not caused to damage, maintenance and inspection are easy and burning treatment is not required. Continuously arranged after a vacuum chamber (12) through pipes (14) are a vacuum pump (16), a reaction gas introducing section (17), a plasma treatment section (18), and a polymer recovering section (20), thus constituting a processing device (10).

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Inventors:
NAMOSE ISAMU
Application Number:
PCT/JP2001/001794
Publication Date:
September 20, 2001
Filing Date:
March 07, 2001
Export Citation:
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Assignee:
SEIKO EPSON CORP (JP)
International Classes:
B01D53/34; B01D53/70; B01J19/08; B04C5/14; B04C5/15; C07B35/06; C07B37/06; C07B61/00; C23C16/44; H01L21/205; (IPC1-7): B01D53/70; H01L21/205
Foreign References:
JP2001054721A2001-02-27
US5965786A1999-10-12
US5569810A1996-10-29
EP0602510A11994-06-22
Other References:
See also references of EP 1224964A4
Attorney, Agent or Firm:
Kamiyanagi, Masataka c/o Intellectual Property Division SEIKO EPSON CORPORATION 3-5 (Owa 3-Chome Suwa-Shi, Nagano, JP)
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