Title:
METHOD AND DEVICE FOR PRODUCING CORPUSCULAR RADIATION SYSTEMS
Document Type and Number:
WIPO Patent Application WO2004066333
Kind Code:
A3
Abstract:
The invention relates to a method for producing corpuscular radiation systems (10-10 "", 12-12"), whereby at least one first corpuscular radiation system (10-10 "") is produced on a first substrate (14) by means of computer-controlled, corpuscular radiation-induced deposition, and at least one second corpuscular radiation system (12-12 ") is produced on at least one second substrate (16) by the at least one first corpuscular radiation system (10-10 "") by means of computer-controlled, corpuscular radiation-induced deposition. The inventive method can be used to produce a plurality of corpuscular radiation systems in a relatively short space of time.
Inventors:
KOOPS HANS WILFRIED PETER (DE)
Application Number:
PCT/EP2004/000559
Publication Date:
August 04, 2005
Filing Date:
January 23, 2004
Export Citation:
Assignee:
NAWOTEC GMBH (DE)
KOOPS HANS WILFRIED PETER (DE)
KOOPS HANS WILFRIED PETER (DE)
International Classes:
H01J9/02; H01J37/317; (IPC1-7): H01J37/317
Foreign References:
| DE19609234A1 | 1997-09-11 | |||
| DE4435043A1 | 1996-04-04 | |||
| US5267884A | 1993-12-07 | |||
| US5145438A | 1992-09-08 |
Other References:
KOOPS H W P ET AL: "Miniature low voltage beam systems producable by combined lithographies", NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, SECTION - A: ACCELERATORS, SPECTROMETERS, DETECTORS AND ASSOCIATED EQUIPMENT, NORTH-HOLLAND PUBLISHING COMPANY. AMSTERDAM, NL, vol. A363, no. 1, 1995, pages 1 - 9, XP004009614, ISSN: 0168-9002
KOOPS H W P ET AL: "Construction of a three-dimensional microtriode by nanolithography with electron-beam induced deposition", VACUUM MICROELECTRONICS CONFERENCE, 1996. IVMC'96., 9TH INTERNATIONAL ST. PETERSBURG, RUSSIA 7-12 JULY 1996, NEW YORK, NY, USA,IEEE, US, 7 July 1996 (1996-07-07), pages 458 - 462, XP010232233, ISBN: 0-7803-3594-5
KOOPS H W P ET AL: "Construction of a three-dimensional microtriode by nanolithography with electron-beam induced deposition", VACUUM MICROELECTRONICS CONFERENCE, 1996. IVMC'96., 9TH INTERNATIONAL ST. PETERSBURG, RUSSIA 7-12 JULY 1996, NEW YORK, NY, USA,IEEE, US, 7 July 1996 (1996-07-07), pages 458 - 462, XP010232233, ISBN: 0-7803-3594-5
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