METHOD AND DEVICE FOR SECONDARY IMAGING OPTICAL PHOTOLITHOGRAPHY

Title:

METHOD AND DEVICE FOR SECONDARY IMAGING OPTICAL PHOTOLITHOGRAPHY

Document Type and Number:

WIPO Patent Application WO/2019/114361

Kind Code:

A1

Abstract:

A method for secondary imaging optical photolithography, comprising: placing a photolithography mask in tight contact with a flexible transparent transfer substrate (1) (S101); using a first light source (202) to shine on a photosensitive layer (4) of the flexible transparent transfer layer via the photolithography mask so as to transfer a pattern of the photolithography mask to the photosensitive layer of the flexible transparent transfer substrate (S102); coating a photoresist on a component substrate for manufacturing a component (S103); placing the flexible transparent transfer substrate in tight contact with the component substrate coated with the photoresist (S104); using a second light source (205) to shine on the component substrate via the flexible transparent transfer substrate so as to transfer the pattern on the photosensitive layer of the flexible transparent transfer substrate to the photoresist of the component substrate by means of the exposure of a photoresist layer (12)(S105); and developing the component substrate having the exposed photoresist to produce a component pattern consistent with the pattern on the photolithography mask (S106). Also disclosed is a device for secondary imaging optical photolithography.

Inventors:

LUO XIANGANG (CN)
WANG CHANGTAO (CN)
WANG YANQIN (CN)
KONG WEIJIE (CN)
GAO PING (CN)
ZHAO ZEYU (CN)

Application Number:

PCT/CN2018/106733

Publication Date:

June 20, 2019

Filing Date:

September 20, 2018

Export Citation:

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Assignee:

INST OPTICS & ELECTRONICS CAS (CN)

International Classes:

G03F7/20

Domestic Patent References:

WO2004114024A2	2004-12-29
WO2003042748A1	2003-05-22

Foreign References:

CN102859441A	2013-01-02
CN102636965A	2012-08-15
CN102866580A	2013-01-09
CN103488059A	2014-01-01

Other References:

PENDRY JB: "Negative Refraction Makes a Perfect Lens", PHYS. REV. LETT., vol. 85, 2000, pages 3966 - 3969, XP001001470, DOI: 10.1103/PhysRevLett.85.3966
See also references of EP 3611571A4

Attorney, Agent or Firm:

CHINA SCIENCE PATENT & TRADEMARK AGENT LTD. (CN)

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