Title:
METHOD AND DEVICE FOR TREATING A WAFER
Document Type and Number:
WIPO Patent Application WO/2010/130786
Kind Code:
A3
Abstract:
In a method for coating a wafer to produce solar cells, a metal such as nickel, copper, or silver is deposited on the wafer in a continuous process in a coating bath containing said metal. A wafer is inserted into the coating bath, and at a time at which a first area of the wafer already extends into the coating bath but a second area does not yet extend into the coating bath, a current surge is applied to the second area of the wafer to initiate the galvanic deposition of the metal on the first area of the wafer reaching into the coating bath for a subsequent further automatic coating, with the wafer completely inserted into the coating bath, also of the remaining area of the wafer without further current surge or current flow.
Inventors:
MAURER WERNER ANDREAS (DE)
Application Number:
PCT/EP2010/056555
Publication Date:
July 14, 2011
Filing Date:
May 12, 2010
Export Citation:
Assignee:
SCHMID GMBH & CO GEB (DE)
MAURER WERNER ANDREAS (DE)
MAURER WERNER ANDREAS (DE)
International Classes:
C25D5/02; H01L31/0224; C25D7/12; C25D17/00
Foreign References:
| US6024849A | 2000-02-15 | |||
| DE102007038120A1 | 2009-02-05 | |||
| US4347115A | 1982-08-31 | |||
| DE102006033353A1 | 2008-01-24 | |||
| DE102005038450A1 | 2007-02-08 | |||
| DE10342512B3 | 2004-10-28 |
Other References:
See also references of EP 2430664A2
Attorney, Agent or Firm:
PATENTANWÄLTE RUFF, WILHELM, BEIER, DAUSTER & PARTNER (Stuttgart, DE)
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