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Title:
METHOD FOR DIRECTIONALLY CONSTRUCTING HETEROSTRUCTURE BY SELECTIVELY ETCHING FERROELECTRIC-BASED PHOTOCATALYTIC MATERIAL
Document Type and Number:
WIPO Patent Application WO/2018/040685
Kind Code:
A1
Abstract:
A method for directionally constructing a heterostructure by selectively etching a ferroelectric-based photocatalytic material, comprising: by using the feature that a ferroelectric field of a semiconductor ferroelectric material (barium titanate, lead titanate, bismuth ferrite or the like) induces a difference in surface charge property, so that negatively charged acid radical ions are preferentially and selectively adsorbed on a positively charged surface, placing the semiconductor ferroelectric material in a water solution containing etching acid, and selectively etching the surface of the ferroelectric material by means of a hydrothermal treatment process, to directionally construct a heterostructure on the surface of a ferroelectric substrate material. By means of the method, an optimal photocatalytic performance can be obtained by adjusting the type and concentration of acid, and a hydrothermal treatment temperature. The directional construction of a heterostructure facilitates the directional separation of photo-generated carriers, and can effectively improve the photocatalytic activity of the heterostructure.

Inventors:
LIU GANG (CN)
MA LI (CN)
ZHEN CHAO (CN)
YANG YONGQIANG (CN)
CHENG HUIMING (CN)
Application Number:
PCT/CN2017/089681
Publication Date:
March 08, 2018
Filing Date:
June 23, 2017
Export Citation:
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Assignee:
INST METAL RESEARCH CAS (CN)
International Classes:
B01J23/14; B01J21/06; B01J23/843; B01J37/10
Foreign References:
CN105126809A2015-12-09
CN103014829A2013-04-03
CH664978A51988-04-15
Other References:
LI XIN ET AL.: "Preparation and photocatalytic performance of Heterostructured (BiO) 2C03/Bi0I Photocatalyst", PORCEEDINGS OF THE 13TH NATTIONAL CONFERENCE ON SOLAR ENERGY PHOTCHEMISTRY AND PHOTOCATALYTIC CHEMISTRY, 26 October 2012 (2012-10-26), pages 281
Attorney, Agent or Firm:
SHENYANG UPDATE INTELLECTUAL PROPERTY AGENCY (CN)
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