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Title:
METHOD FOR DRYING SEPARATION MEMBRANE AND METHOD FOR PRODUCING SEPARATION MEMBRANE STRUCTURE
Document Type and Number:
WIPO Patent Application WO/2018/088064
Kind Code:
A1
Abstract:
This method for drying a separation membrane (12) comprises a step wherein a gas for drying is supplied to the separation membrane at such a rate that the value obtained by dividing the difference between the maximum value and the minimum value of the flow rate of the gas for drying on the membrane surface of the separation membrane (12) by the minimum value of the flow rate is 15% or less. The gas for drying is a gas at a temperature of 40°C or less, which contains a water-soluble gas that has a solubility in 1 cm3 of water of 0.5 cm3 or more at 40°C at 1 atmosphere.

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JPH10174834MEMBRANE MODULE FOR VAPOR-LIQUID CONTACT AND ITS PRODUCTION
Inventors:
NODA KENICHI (JP)
HAGIO TAKESHI (JP)
Application Number:
PCT/JP2017/035949
Publication Date:
May 17, 2018
Filing Date:
October 03, 2017
Export Citation:
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Assignee:
NGK INSULATORS LTD (JP)
International Classes:
B01D67/00
Domestic Patent References:
WO2016084845A12016-06-02
Foreign References:
JP2016159211A2016-09-05
JP2014208334A2014-11-06
JP2008237946A2008-10-09
JP2001133155A2001-05-18
JP2010089000A2010-04-22
JPH04256423A1992-09-11
JPH10202071A1998-08-04
Attorney, Agent or Firm:
SHINJYU GLOBAL IP (JP)
Download PDF:
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