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Title:
METHOD FOR EFFICIENTLY INSPECTING LARGE AREA OF MICROELECTRONIC DEVICES
Document Type and Number:
WIPO Patent Application WO/2019/179083
Kind Code:
A1
Abstract:
A method for efficiently inspecting a large area of microelectronic devices, the method comprising: generating a light beam at a specific frequency by means of an optical source control module (A), dividing the same into coherent light beams having the same frequency and the same phase by means of a beam-splitting interferometric optical module (B), with one beam being reflected by surfaces of microelectronic devices under test, and the other being reflected by a reflective mirror, such that interference of the two reflected beams is caused; and during a test process, controlling a test condition of the microelectronic devices under test by means of a sample control module (C), receiving a generated interference pattern by means of a data acquisition and analysis module (D), and analyzing the same by means of computer software. The method enables non-contact measurement of minute deformations on a surface or an interface of a large area of microelectronic devices and has advantages of being high-precision and having a global view, enabling real-time and lossless inspection.

Inventors:
ZHONG YIXUN (CN)
YAO RIHUI (CN)
NING HONGLONG (CN)
WEI JINGLIN (CN)
Application Number:
PCT/CN2018/110445
Publication Date:
September 26, 2019
Filing Date:
October 16, 2018
Export Citation:
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Assignee:
UNIV SOUTH CHINA TECH (CN)
International Classes:
G01N21/88; G01N21/45
Foreign References:
CN108508019A2018-09-07
CN208013103U2018-10-26
CN103615993A2014-03-05
CN106197257A2016-12-07
CN107193141A2017-09-22
JPS62269048A1987-11-21
Attorney, Agent or Firm:
GUANGZHOU HUAXUE INTELLECTUAL PROPERTY AGENCY CO., LTD. (CN)
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