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Title:
METHOD FOR ELECTROCHEMICAL POLISH IN CONSTANT VOLTAGE MODE
Document Type and Number:
WIPO Patent Application WO/2017/070924
Kind Code:
A1
Abstract:
A method for electrochemical polish in constant voltage mode, comprising: presetting a constant current recipe with a current distribution which comprises multiple positions with different radius on a wafer and a predetermined current for each position; applying the constant current recipe to polish a first wafer; detecting and recording the voltage of each position during the polish; generating a constant voltage recipe with a voltage distribution which comprises the multiple positions and the recorded voltage of each position; and applying the constant voltage recipe to polish a second wafer.

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Inventors:
JIN YINUO (CN)
DAI YINGWEI (CN)
WANG JIAN (CN)
WANG HUI (CN)
Application Number:
PCT/CN2015/093343
Publication Date:
May 04, 2017
Filing Date:
October 30, 2015
Export Citation:
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Assignee:
ACM RES (SHANGHAI) INC (CN)
International Classes:
C25F3/22
Foreign References:
US5139624A1992-08-18
CN104838480A2015-08-12
TW200809014A2008-02-16
US20040129576A12004-07-08
Attorney, Agent or Firm:
SHANGHAI PATENT & TRADEMARK LAW OFFICE, LLC (CN)
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