Title:
METHOD FOR ESTABLISHING TEMPERATURE DISTRIBUTION MAP LIBRARY AND METHOD FOR ACQUIRING WAFER SURFACE TEMPERATURE
Document Type and Number:
WIPO Patent Application WO/2024/001047
Kind Code:
A1
Abstract:
The embodiments of the present application disclose a method for establishing a temperature distribution map library and a method for acquiring a wafer surface temperature. The method for establishing a temperature distribution map library involves: performing a temperature test to obtain a surface temperature distribution situation of a wafer; performing wafer simulation analysis to determine candidate simulation parameters causing a simulation result to conform to the temperature test result; changing the boundary conditions of the temperature test and again performing a temperature test; inputting the candidate simulation parameters into the changed boundary conditions and again performing simulation analysis, so as to determine a set of conforming simulation parameters causing the simulation result to conform to the temperature test result; based on the conforming simulation parameters, obtaining surface temperature distribution situations for the wafer under different boundary conditions, so as to construct a temperature distribution map library. By means of the temperature distribution map library, the present application is not only able to more-precisely and rapidly determine a wafer surface temperature distribution situation, avoiding performing multiple temperature tests, but is additionally able to reduce the cost of acquiring a wafer surface temperature.
Inventors:
HUANG SHUAISHUAI (CN)
XIAO YUNZHANG (CN)
ZHONG GUOFANG (CN)
KANG BOWEN (CN)
CHEN BINGAN (CN)
XIAO YUNZHANG (CN)
ZHONG GUOFANG (CN)
KANG BOWEN (CN)
CHEN BINGAN (CN)
Application Number:
PCT/CN2022/136250
Publication Date:
January 04, 2024
Filing Date:
December 02, 2022
Export Citation:
Assignee:
SHENZHEN NASO TECH CO LTD (CN)
International Classes:
G06F30/20; G06F119/08
Foreign References:
| CN115048803A | 2022-09-13 | |||
| CN112507574A | 2021-03-16 | |||
| CN113158589A | 2021-07-23 | |||
| CN102411259A | 2012-04-11 | |||
| JP2010219462A | 2010-09-30 |
Other References:
LIU MIN; ZHENG LIU; HE ZHI; WANG WEN-WU: "Numerical Simulation of Temperature Field Distribution Induced by Laser Annealing in Silicon Wafer", JIGUANG YU HONGWAI - LASER & INFRARED, JIGUANG YU HONGWAI BIANJIBU, BEIJING, CN, vol. 52, no. 4, 30 April 2022 (2022-04-30), CN , pages 515 - 521, XP009551503, ISSN: 1001-5078
Attorney, Agent or Firm:
BEIJING BRIGHT IP AGENCY CO., LTD. (CN)
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