Title:
METHOD FOR FABRICATING MULTI-COLOR COLOR RESISTOR
Document Type and Number:
WIPO Patent Application WO/2018/188134
Kind Code:
A1
Abstract:
A method for fabricating a multi-color color resistor, comprising: moving a photomask so that alignment marks (604) are respectively aligned with marks (601, 602, 603) positioned on a black matrix layer; respectively forming color resistors (801, 802, 803) and corresponding color blocks (704, 705, 706) on the black matrix layer by using the photomask; and checking the positions of the color resistors (801, 802, 803) according to the positional relationship between the color blocks (704, 705, 706) and corresponding hollowed-out regions (701, 702, 703), wherein the interval between the first mark (601) and the second mark (602) and the interval between the first mark (601) the third mark (603) are respectively configured such that the color blocks (704, 705, 706) do not overlap each other. With the present invention, the size of the color blocks (704, 705, 706) does not change and the color blocks (704, 705, 706) do not overlap each other.
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Inventors:
GAN QIMING (CN)
Application Number:
PCT/CN2017/082747
Publication Date:
October 18, 2018
Filing Date:
May 02, 2017
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECT (CN)
International Classes:
G03F7/00; G02F1/1335
Domestic Patent References:
| WO2011099211A1 | 2011-08-18 |
Foreign References:
| CN106918948A | 2017-07-04 | |||
| CN101609227A | 2009-12-23 | |||
| CN103969873A | 2014-08-06 | |||
| CN102681251A | 2012-09-19 | |||
| CN103631433A | 2014-03-12 | |||
| CN105182680A | 2015-12-23 | |||
| CN203502701U | 2014-03-26 | |||
| US6454414B1 | 2002-09-24 | |||
| EP0616233A2 | 1994-09-21 | |||
| CN105652506A | 2016-06-08 | |||
| CN1442754A | 2003-09-17 |
Attorney, Agent or Firm:
YUHONG INTELLECTUAL PROPERTY LAW FIRM (CN)
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