Title:
METHOD FOR FABRICATING A POROUS CARBON STRUCTURE USING OPTICAL INTERFERENCE LITHOGRAPHY, AND POROUS CARBON STRUCTURE FABRICATED BY SAME
Document Type and Number:
WIPO Patent Application WO/2011/090233
Kind Code:
A1
Abstract:
Provided are a method for fabricating a porous carbon structure using optical interference lithography, and a porous carbon structure fabricated by same, wherein the method for fabricating a porous carbon structure using optical light interference lithography includes: forming a photoresist layer on a substrate; irradiating a three-dimensional optical interference pattern onto the photoresist formed using three-dimensional optical interference lithography to form a three-dimensional porous photoresist pattern; coating the formed three-dimensional porous photoresist pattern with an inorganic material; heating the photoresist pattern on which the inorganic material is coated to carbonize the pattern; and removing the coated inorganic material.
Inventors:
MOON JUN HYUK (KR)
JIN WOO MIN (KR)
SHIN JUHWAN (KR)
JIN WOO MIN (KR)
SHIN JUHWAN (KR)
Application Number:
PCT/KR2010/002359
Publication Date:
July 28, 2011
Filing Date:
April 15, 2010
Export Citation:
Assignee:
UNIV SOGANG IND UNIV COOP FOUN (KR)
MOON JUN HYUK (KR)
JIN WOO MIN (KR)
SHIN JUHWAN (KR)
MOON JUN HYUK (KR)
JIN WOO MIN (KR)
SHIN JUHWAN (KR)
International Classes:
C01B31/02; G03F7/20
Foreign References:
| US6024899A | 2000-02-15 | |||
| US20070248760A1 | 2007-10-25 | |||
| US7264990B2 | 2007-09-04 | |||
| US7335395B2 | 2008-02-26 |
Attorney, Agent or Firm:
SUH, HYUNG MI (KR)
서형미 (KR)
서형미 (KR)
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Claims:
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