Title:
METHOD FOR FABRICATING SUPERCONDUCTING DEVICES USING A FOCUSED ION BEAM
Document Type and Number:
WIPO Patent Application WO/2016/003626
Kind Code:
A3
Abstract:
Nano-scale junctions, wires, and junction arrays are created by using a focused high-energy ion beam to direct-write insulating or poorly conducting barriers into thin films of materials that are sensitive to disorder, including superconductors, ferromagnetic materials and semiconductors.
Inventors:
CYBART SHANE A (US)
CHO ETHAN Y (US)
DYNES ROBERT C (US)
WONG TRAVIS J (US)
CHO ETHAN Y (US)
DYNES ROBERT C (US)
WONG TRAVIS J (US)
Application Number:
PCT/US2015/035426
Publication Date:
February 25, 2016
Filing Date:
June 11, 2015
Export Citation:
Assignee:
UNIV CALIFORNIA (US)
International Classes:
H01L39/24; H01L39/22
Foreign References:
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US20120199737A1 | 2012-08-09 | |||
US20110147609A1 | 2011-06-23 | |||
US5416072A | 1995-05-16 | |||
US5801393A | 1998-09-01 | |||
US20100230814A1 | 2010-09-16 | |||
US6924493B1 | 2005-08-02 | |||
US5109164A | 1992-04-28 |
Other References:
BODEA ET AL.: "Modification and nano-patterning of high-Tc superconducting thin films by masked ion beam radiation.", 9TH EUROPEAN CONFERENCE ON APPLIED SUPERCONDUCTIVITY (EUCAS 09) IOP PUBLISHING. JOURNAL OF PHYSICS: CONFERENCE SERIES, vol. 234, 2010, XP020193482, Retrieved from the Internet [retrieved on 20151123], doi:10.1088/1742-6596/234/1/012005
Attorney, Agent or Firm:
MUSICK, Eleanor et al. (300 S. Wacker Drive #2500Chicago, Illinois, US)
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