Title:
METHOD FOR FORMING CONDUCTIVE FILM PATTERN
Document Type and Number:
WIPO Patent Application WO/2012/008204
Kind Code:
A1
Abstract:
There has been a problem wherein highly fine patterns cannot be obtained using inkjet systems since photolithography, mask sputtering, i.e., conventional electrode-forming methods, have difficult problems to solve in order to meet the needs with respect to step simplification, material use efficiency, cost and various substrate sizes.
Disclosed is a method for forming a conductive film pattern, wherein desired electrode patterning is performed using a photosensitive coating type electrode material. In an electrode-forming step, a desired electrode pattern can be obtained by performing first exposure and second exposure using a high cost performance lamp having diffusion light as a light source, said second exposure having an exposure quantity larger than that of the first exposure. The problems that have not been solved to meet the needs with respect to material use efficiency, cost and various substrate sizes by the conventional methods at the time of forming, for instance, the wiring electrodes of touch panels, and the issue of highly fine electrode patterning that has not been solved by the inkjet systems are solved by the double exposure process using the diffusion light.
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Inventors:
SUGINOYA, Mitsuru (8 Nakase 1-chome, Mihama-ku, Chiba-sh, Chiba 07, 〒2618507, JP)
杉野谷 充 (〒07 千葉県千葉市美浜区中瀬１丁目８番地 セイコーインスツル株式会社内 Chiba, 〒2618507, JP)
KOBAYASHI, Tomoatsu (8 Nakase 1-chome, Mihama-ku, Chiba-sh, Chiba 07, 〒2618507, JP)
杉野谷 充 (〒07 千葉県千葉市美浜区中瀬１丁目８番地 セイコーインスツル株式会社内 Chiba, 〒2618507, JP)
KOBAYASHI, Tomoatsu (8 Nakase 1-chome, Mihama-ku, Chiba-sh, Chiba 07, 〒2618507, JP)
Application Number:
JP2011/060267
Publication Date:
January 19, 2012
Filing Date:
April 27, 2011
Export Citation:
Assignee:
SEIKO INSTRUMENTS INC. (8 Nakase 1-chome, Mihama-ku Chiba-sh, Chiba 07, 〒2618507, JP)
セイコーインスツル株式会社 (〒07 千葉県千葉市美浜区中瀬１丁目８番地 Chiba, 〒2618507, JP)
SUGINOYA, Mitsuru (8 Nakase 1-chome, Mihama-ku, Chiba-sh, Chiba 07, 〒2618507, JP)
杉野谷 充 (〒07 千葉県千葉市美浜区中瀬１丁目８番地 セイコーインスツル株式会社内 Chiba, 〒2618507, JP)
セイコーインスツル株式会社 (〒07 千葉県千葉市美浜区中瀬１丁目８番地 Chiba, 〒2618507, JP)
SUGINOYA, Mitsuru (8 Nakase 1-chome, Mihama-ku, Chiba-sh, Chiba 07, 〒2618507, JP)
杉野谷 充 (〒07 千葉県千葉市美浜区中瀬１丁目８番地 セイコーインスツル株式会社内 Chiba, 〒2618507, JP)
International Classes:
G03F7/20; H01B13/00
Attorney, Agent or Firm:
KUHARA, Kentaro et al. (8 Nakase 1-chome, Mihama-ku, Chiba-sh, Chiba 07, 〒2618507, JP)
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Claims:
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