Title:
METHOD FOR FORMING FINE PATTERN OF POLYIMIDE BY IMPRINTING
Document Type and Number:
WIPO Patent Application WO/2015/056487
Kind Code:
A1
Abstract:
Provided is a simple method for forming a pattern of a polyimide, which enables a more excellent processed shape and more excellent dimensional accuracy of the processed shape in comparison to conventional polyimide processing techniques such as photolithography and laser processing.
During the formation of a fine pattern of a polyimide, a solvent-soluble polyimide resin composition, which is photosensitive and can be molded at a temperature that is not more than the glass transition temperature, is used as the polyimide, and the polyimide resin composition is patterned by thermal imprinting and then thermally cured. Subsequent to the mold release after the molding step in the above-described method, ultraviolet light irradiation is carried out.
Inventors:
YOUN SUNG WON (JP)
PARK SANG CHEON (JP)
HIROSHIMA HIROSHI (JP)
TAKAGI HIDEKI (JP)
SUZUKI KENTA (JP)
PARK SANG CHEON (JP)
HIROSHIMA HIROSHI (JP)
TAKAGI HIDEKI (JP)
SUZUKI KENTA (JP)
Application Number:
PCT/JP2014/072804
Publication Date:
April 23, 2015
Filing Date:
August 29, 2014
Export Citation:
Assignee:
NAT INST OF ADVANCED IND SCIEN (JP)
International Classes:
B29C59/02; H01L21/027
Foreign References:
| JP2013154637A | 2013-08-15 | |||
| JP2008307808A | 2008-12-25 | |||
| JP2013042124A | 2013-02-28 | |||
| JP2003183496A | 2003-07-03 | |||
| JP2010260902A | 2010-11-18 | |||
| JP2011077251A | 2011-04-14 |
Attorney, Agent or Firm:
HIRAKI Yusuke et al. (JP)
Yusuke Hiraki (JP)
Yusuke Hiraki (JP)
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