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Patent Searching and Data


Title:
METHOD FOR FORMING METAL OXIDE FILM, METAL OXIDE FILM AND APPARATUS FOR FORMING METAL OXIDE FILM
Document Type and Number:
WIPO Patent Application WO/2011/027425
Kind Code:
A1
Abstract:
A method for forming a metal oxide film, which can further improve the production efficiency while maintaining low resistivity of a metal oxide film formed thereby.  The method for forming a metal oxide film comprises the following steps: a step wherein a solution (4) containing a metal element and ethylenediamine (4a) is formed into a mist; a step wherein a substrate (2) is heated; and a step wherein the mist of the solution (4) obtained in the above-mentioned step is supplied to a first major surface of the substrate (2) which has been heated in the above-mentioned heating step.

Inventors:
ORITA HIROYUKI (JP)
SHIRAHATA TAKAHIRO (JP)
YOSHIDA AKIO (JP)
FUJITA SHIZUO (JP)
KAMEYAMA NAOKI (JP)
KAWAHARAMURA TOSHIYUKI (JP)
Application Number:
PCT/JP2009/065314
Publication Date:
March 10, 2011
Filing Date:
September 02, 2009
Export Citation:
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Assignee:
TOSHIBA MITSUBISHI ELEC INC (JP)
UNIV KYOTO (JP)
ORITA HIROYUKI (JP)
SHIRAHATA TAKAHIRO (JP)
YOSHIDA AKIO (JP)
FUJITA SHIZUO (JP)
KAMEYAMA NAOKI (JP)
KAWAHARAMURA TOSHIYUKI (JP)
International Classes:
C23C18/12; B05D3/02; H01L21/288
Foreign References:
JP2005264230A2005-09-29
JPS6039171A1985-02-28
Attorney, Agent or Firm:
YOSHITAKE Hidetoshi et al. (JP)
Hidetoshi Yoshitake (JP)
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