Title:
METHOD FOR FORMING MICROWIRE BY USING LASER CHEMICAL VAPOR DEPOSITION
Document Type and Number:
WIPO Patent Application WO/2020/059897
Kind Code:
A1
Abstract:
Disclosed is a microwire forming method comprising the steps of: forming an alloy wire comprising multiple metal elements on a substrate while supplying a source gas comprising multiple metal elements through laser chemical vapor deposition (LCVD); and performing laser heat treatment in an area comprising the metal wire. According to the microwire forming method of the present invention, a microwire is formed primarily in an LCVD type, a high-thickness growth having a narrow width and an excellent film quality is accomplished within a short period of time through alloy deposition, and inner film quality defects of the microwire are removed through subsequent laser heat treatment. Accordingly, the texture compactness and the film quality can be improved, and the uniformity and the conductive stability can be increased. In addition, the emission width, the output intensity, and the emission type are adjusted such that patterns are condensed in the process of partial melting and cooling, thereby forming a microwire having a line width of 2μm or less.
Inventors:
KIM WOO JIN (KR)
KOO HYUNG JUN (KR)
CHA JUNG TAE (KR)
KOO HYUNG JUN (KR)
CHA JUNG TAE (KR)
Application Number:
PCT/KR2018/010962
Publication Date:
March 26, 2020
Filing Date:
September 18, 2018
Export Citation:
Assignee:
COWINDST CO LTD (KR)
International Classes:
H05K3/14; H05K3/22
Foreign References:
KR20170112526A | 2017-10-12 | |||
KR20090016254A | 2009-02-13 | |||
KR20080070368A | 2008-07-30 | |||
KR20180068637A | 2018-06-22 | |||
KR20050092982A | 2005-09-23 | |||
KR20180108935A | 2018-10-05 |
Attorney, Agent or Firm:
KIM, Inhan (KR)
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