Title:
METHOD FOR FORMING ORGANIC SEMICONDUCTOR FILM
Document Type and Number:
WIPO Patent Application WO/2014/141846
Kind Code:
A1
Abstract:
Provided is a method for forming an organic semiconductor film wherein a solution containing an organic semiconductor material and a solvent is applied to at least one part of a base material in order to form a solution film, at least one part of the solution film is irradiated with electromagnetic waves that have a wavelength of at least 8 µm and an energy density of 0.1-10 J/cm2 at the surface of the solution film prior to drying of the solution film, and the solution film is dried. As a result, an organic semiconductor film having good crystallinity is formed.
Inventors:
MAEHARA YOSHIKI (JP)
USAMI YOSHIHISA (JP)
USAMI YOSHIHISA (JP)
Application Number:
PCT/JP2014/054012
Publication Date:
September 18, 2014
Filing Date:
February 20, 2014
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
H01L21/368; H01L29/786; H01L51/05; H01L51/30; H01L51/40
Foreign References:
| JP2004247716A | 2004-09-02 | |||
| JP2005211769A | 2005-08-11 | |||
| JP2005508515A | 2005-03-31 | |||
| JP2010016212A | 2010-01-21 |
Attorney, Agent or Firm:
WATANABE Mochitoshi et al. (JP)
Mochitoshi Watanabe (JP)
Mochitoshi Watanabe (JP)
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