Title:
METHOD FOR FORMING PATTERN AND CATALYST AND ELECTRONIC ELEMENT USING METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2015/005517
Kind Code:
A1
Abstract:
Provided are a method for forming a pattern, and a catalyst and an electronic element using the method. The method for forming a pattern comprises the steps of: preparing, on a surface, a substrate sequentially including a photoconductive material layer and an oxide layer; making an area, on which a pattern is to be formed, on the oxide layer of the substrate, come into contact with an electrolyte; connecting the substrate and the electrolyte to a first electrode and a second electrode connected to a power source, respectively; and selectively irradiating light from a light source to the electrolyte and applying a voltage to the first electrode or the second electrode, thereby directly forming the pattern on the oxide layer of the substrate.
Inventors:
CHUNG TAEK DONG (KR)
LIM SUNG YUL (KR)
LIM SUNG YUL (KR)
Application Number:
PCT/KR2013/006658
Publication Date:
January 15, 2015
Filing Date:
July 25, 2013
Export Citation:
Assignee:
SNU R&DB FOUNDATION (KR)
International Classes:
H01L21/027; H01L21/316
Foreign References:
| KR101211293B1 | 2012-12-11 | |||
| KR100586609B1 | 2006-06-07 | |||
| KR20100133600A | 2010-12-22 | |||
| KR20100020756A | 2010-02-23 | |||
| US5445997A | 1995-08-29 |
Other References:
SUNG YUL LIM ET AL.: "Optoelectrochemical Reactions on Hydrogenated AmorphousSilicon Electrodes", THE 63RD ANNUAL MEETING OF THE INTERNATIONAL SOCIETY OF ELECTROCHEMISTRY, 19 August 2012 (2012-08-19), PRAGUE, CZECH REPUBLIC
Attorney, Agent or Firm:
Y.P.LEE, MOCK & PARTNERS (KR)
리앤목 특허법인 (KR)
리앤목 특허법인 (KR)
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