METHOD FOR FORMING PATTERN AND TREATING AGENT FOR USE THEREIN

Title:

METHOD FOR FORMING PATTERN AND TREATING AGENT FOR USE THEREIN

Document Type and Number:

WIPO Patent Application WO/2002/041081

Kind Code:

A1

Abstract:

A method for forming a pattern which comprises a step of forming a chemical amplification photoresist film on a substrate, a step of applying an organic acid containing treating agent having a pH of 1.3 to 4.5 on the resist film, a step of baking the resist film, a step of selectively exposing the resist film to light, a step of baking the resist film after the exposure, a step of washing the treating agent present on the resist with water and subjecting it to spin drying, and a step of developing the resist film. The method allows, through the application of a specific treating agent to a photoresist film, the decrease of the contact angle of a developer to the resist film and the improvement of the wetability between them and the reduction of undesirable effect of a floating basic species, resulting in the formation of a pattern having a good shape.

Inventors:

IJIMA KAZUYO (JP)
TAKANO YUSUKE (JP)
TANAKA HATSUYUKI (JP)
FUNATO SATORU (JP)

Application Number:

PCT/JP2001/009320

Publication Date:

May 23, 2002

Filing Date:

October 24, 2001

Export Citation:

Click for automatic bibliography generation Help

Assignee:

CLARIANT INT LTD (CH)
IJIMA KAZUYO (JP)
TAKANO YUSUKE (JP)
TANAKA HATSUYUKI (JP)
FUNATO SATORU (JP)

International Classes:

G03F7/038; G03F7/039; G03F7/16; G03F7/26; G03F7/38; H01L21/027; (IPC1-7): G03F7/38; G03F7/039; H01L21/027

Foreign References:

JPH0540346A	1993-02-19
JPH05341536A	1993-12-24
JPH06267838A	1994-09-22
US5648199A	1997-07-15

Other References: