Title:
METHOD OF FORMING PATTERN
Document Type and Number:
WIPO Patent Application WO/2000/026726
Kind Code:
A1
Abstract:
A method of forming a pattern comprising: (1) depositing an energy-sensitive layer on the surface of a resin layer for formation of an insulating film, (2) emitting an active energy beam or heat wave directly or through a mask to obtain a desired pattern, (3) developing the energy-sensitive layer to form a resist pattern of the energy-sensitive layer, and (4) removing the resin layer by a further development process to obtain the desired pattern.
Inventors:
IMAI GENJI (JP)
OONISHI KENGO (JP)
HONMA HIROYUKI (JP)
KOGURE HIDEO (JP)
OONISHI KENGO (JP)
HONMA HIROYUKI (JP)
KOGURE HIDEO (JP)
Application Number:
PCT/JP1999/006116
Publication Date:
May 11, 2000
Filing Date:
November 02, 1999
Export Citation:
Assignee:
KANSAI PAINT CO LTD (JP)
IMAI GENJI (JP)
ONISHI KENGO (JP)
HONMA HIROYUKI (JP)
KOGURE HIDEO (JP)
IMAI GENJI (JP)
ONISHI KENGO (JP)
HONMA HIROYUKI (JP)
KOGURE HIDEO (JP)
International Classes:
G03F7/00; G03F7/004; G03F7/09; G03F7/40; H05K3/00; H05K3/28; G03F7/30; H05K1/03; (IPC1-7): G03F7/11; G03F7/30; G03F7/004; G03F7/42; G02B5/20; G02B5/00
Foreign References:
| JPS4741374A | ||||
| JPH01260831A | 1989-10-18 | |||
| JPH04147631A | 1992-05-21 | |||
| JPH06132208A | 1994-05-13 | |||
| JPH0677159A | 1994-03-18 | |||
| JPH08279488A | 1996-10-22 | |||
| JPH06242603A | 1994-09-02 | |||
| JPH10207046A | 1998-08-07 |
Attorney, Agent or Firm:
Katagiri, Mitsuji (Akasaka 4-chome Minato-ku Tokyo, Akasaka 4-chome Minato-ku Tokyo, JP)
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